-->

Rufus Giwa Poly Post UTME Application Form - 2017/2018

Rufus Giwa Polytechnic, Owo, RUGIPO Post UTME screening exercise application form for the 2017/2018 academic session is out. Rufus Giwa Poly post UTME minimum cut-off mark is 150.
Latest Update: The reprint for the examination starts by fri. 19th Oct. 2017, the examination hold between Tue. 24th Oct. to Thur. 26th Oct. 2017.
Rufus Giwa Poly Post UTME Application Form - 2017/2018
Rufus Giwa Poly Post UTME Application Form - 2017/2018

The Rufus Giwa Polytechnic, Owo, invites applications from suitably QUALIFIED CANDIDATES FOR ADMISSION INTO National Diploma (ND) programmes of the School for the 2017/2018 Academic Session.

Rufus Giwa Polytechnic Post UTME Cut-Off Mark

Only candidates that scored 150 and above in the 2017 Unified Tertiary Matriculation Examination (UTME) conducted by Joint Admissions and Matriculation Board (JAMB) are invited to apply and participate in  the screening exercise.

Rufus Giwa Polytechnic Post UTME Registration Scratch Cards

Candidates are enjoined to visit the Portal of the Polytechnic (sf.rugipo.edu.ng) for further information and register with effect from Tuesday, 5th September, 2017. 

Candidates that pay through on-line shall follow the procedure and information they see on the computer system while those who pay through Banks shall generate their invoice copies and take same to bank for payment. All the candidates are permitted to download the past questions online. 

Meanwhile, the screening fee is two thousand naira (₦2,000.00) only.

Applicants for the screening exercise are also requested to upload the following:
  • JAMB Data (with score)
  • the results (WAEC, NECO, GCE and NABTEB)
  • passport photograph
The candidates are advised to print their admission screening forms and thereafter reprint the dates for their Post-UTME tests by Friday 20th October 2017. The screening exercise will starts on Tuesday, 24th October and ends on Thursday, 26th October, 2017.

Registration Closes on Thursday 19th of October, 2017 by 12 P.M.
Techy Pranav Pranavkd PranavKD Techy Pranav Pranavkd PranavKD Techy Pranav Pranavkd PranavKD Techy Pranav Pranavkd PranavKD Techy Pranav Pranavkd PranavKD Techy Pranav Pranavkd PranavKD Techy Pranav Pranavkd PranavKD Techy Pranav Pranavkd PranavKD Techy Pranav Pranavkd PranavKD Techy Pranav Pranavkd PranavKD Techy Pranav Pranavkd PranavKD Techy Pranav Pranavkd PranavKD Techy Pranav Pranavkd PranavKD Techy Pranav Pranavkd PranavKD